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applied to all substrates
1 This Guide provides the tools to describe individual wafers in a 3DS-IC process
field level(s)
This method is for UHP efficient removal of low-level contaminants
The test under actual operating conditions is intended to allow the user to evaluate the manufacturer’s component selection as well as the quality of the panel design
F06700 - SEMI F67 - Test Method for Determining Inert Gas Purifier Capacity Lang-Japanese applied to all substratesThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on June 4, 2013. Available at www. semiviews. org and www. semi. org in July 2013; originally published November 2001; previously published November 2008. The purpose of this Document is to define a test method to quantify impurity removal capacity of inert gas purifiers. To determine